Oxidation of Mg atomic monolayer onto silicon: A road toward MgOx/Mg2Si (11–1)/Si (100) heterostructure

Abstract : Surface interfaces of thin magnesium oxide films elaborated onto Si(100)–(2 × 1) substrates were characterized using scanning tunneling microscopy and spectroscopy, Auger electron spectroscopy, atomic force microscopy, and high-resolution transmission electron microscopy. We report that a flat and highly homogeneous magnesium oxide with well-defined interfaces could be grown at room temperature (RT) by repeating alternate adsorption of Mg atomic monolayer and O2 on Si(100). RT oxidation process of the first Mg monolayer plays a crucial role as driving force allowing a partial decomposition of amorphous ultra-thin Mg2Si at the Mg/Si interface to form more magnesium oxide in the surface. This process induces crystallization of the interfacial Mg2Si thin film and then gives arise to an unexpected MgOx/Mg2Si(11–1)/Si(100) heterostructure. MgOx monolayer displays a band gap of about 6 eV and exhibits a weak RMS roughness on large areas.
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Sarpi Brice, Nabil Rochdi, Rachid Daineche, Maxime Bertoglio, Christophe Girardeaux, et al.. Oxidation of Mg atomic monolayer onto silicon: A road toward MgOx/Mg2Si (11–1)/Si (100) heterostructure. Surface Science Letters, Elsevier, 2015, 642, pp.L1-L5. 〈http://www.sciencedirect.com/science/article/pii/S003960281500223X〉. 〈10.1016/j.susc.2015.08.003〉. 〈hal-01496546〉



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