Modeling of the interface formation during CuO deposition on Al(111) substrate: linking material design and elaboration process parameters through multi-levels approach

Mathilde Guiltat 1 Nicolas Salles 1 Marie Brut 1 Georges Landa 1 Nicolas Richard 2 Sébastien Vizzini 3 Anne Hémeryck 1
1 LAAS-M3 - Équipe Modélisation Multi-niveaux des Matériaux
LAAS - Laboratoire d'analyse et d'architecture des systèmes [Toulouse]
2 DAM/DIF - DAM Île-de-France
3 IM2NP - Institut des Matériaux, de Microélectronique et des Nanosciences de Provence
Abstract : In this paper, we use a multi-levels modeling approach to describe the elaboration of directly integrated energetic materials. The deposition of copper oxide on aluminum substrate is described. Atomic scale calculations are first conducted to identify local mechanisms involved during the growth of CuO on Al(111). These atomic scale data are then used to parameterize a macroscopic code, inspired on a kinetic Monte Carlo methodology dedicated to simulate vapor like deposition process. The objective is to establish the link between the microstructure of materials and the way they are achieved, i.e. the process parameters such as temperature and gas pressure. This work is conducted in the context of the integration of nano-structured energetic thermites used as micro energy source in microelectronic devices. We show that the temperature of the deposition process appears as the driving parameter to tailor the thickness of interfacial layers.
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Modelling and Simulation in Materials Science and Engineering, IOP Publishing, 2017, Focus on MMM 2016, 25 (6), pp.064005. 〈http://iopscience.iop.org/article/10.1088/1361-651X/aa7bbc/meta;jsessionid=8B76486D63ECCDCDFAEE0D5544A95821.c1.iopscience.cld.iop.org〉. 〈10.1088/1361-651X/aa7bbc〉
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Dernière modification le : mardi 11 septembre 2018 - 15:19:15

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Mathilde Guiltat, Nicolas Salles, Marie Brut, Georges Landa, Nicolas Richard, et al.. Modeling of the interface formation during CuO deposition on Al(111) substrate: linking material design and elaboration process parameters through multi-levels approach. Modelling and Simulation in Materials Science and Engineering, IOP Publishing, 2017, Focus on MMM 2016, 25 (6), pp.064005. 〈http://iopscience.iop.org/article/10.1088/1361-651X/aa7bbc/meta;jsessionid=8B76486D63ECCDCDFAEE0D5544A95821.c1.iopscience.cld.iop.org〉. 〈10.1088/1361-651X/aa7bbc〉. 〈hal-01574744〉

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