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Soft mold NanoImprint Lithography: a versatile tool for sub-wavelength grating applications

Abstract : Due to its independency to the substrate used, Soft mold NanoImprint Lithography (S-NIL) is a technique of great interest in particular for the fabrication of optical devices. We demonstrate a mature pathway for the fabrication of optical filters from the conception to the optical characterization. Those filters can be fabricated on large surfaces (up to 600 diameter wafers) with high conformity on various substrates. Quality of the transfer will be discussed throughout the process and optical performances compared to those obtained with classical techniques. In this paper we fabricated tunable spectral filters with a grating periodicity down to 260 nm and imprint surfaces up to 600. Physical conformity of the gratings will be discussed in terms of long-range stitching obtained on 600 Si hard mold, dimensional shrinkage during thermal NanoImprint on Zeonor(R) soft mold and conformity towards patterned hard mold throughout the process.
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https://hal.laas.fr/hal-01706924
Contributor : Sylvain Pelloquin <>
Submitted on : Monday, February 12, 2018 - 1:14:22 PM
Last modification on : Friday, January 10, 2020 - 9:10:14 PM

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Sylvain Pelloquin, Sylvain Augé, Ksenia Sharshavina, Jean-Baptiste Doucet, Anatole Héliot, et al.. Soft mold NanoImprint Lithography: a versatile tool for sub-wavelength grating applications. Microsystem Technologies, Springer Verlag, 2018, ⟨10.1007/s00542-018-3740-6⟩. ⟨hal-01706924⟩

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