Anisotropy in the wet thermal oxidation of AlGaAs: influence of process parameters - Archive ouverte HAL Access content directly
Journal Articles Optical Materials Express Year : 2018

Anisotropy in the wet thermal oxidation of AlGaAs: influence of process parameters

Gael Lafleur
  • Function : Author
Guilhem Almuneau
Henri Camon
Stéphane Calvez

Abstract

The crystallographic anisotropy of the lateral selective thermal oxidation of AlGaAs alloys is experimentally studied. The anisotropic behavior of this oxidation process, used primarily for building a lateral confinement in vertical surface emitting lasers (VCSEL), is quantified by varying different process parameters and the geometrical shapes of laterally oxidized mesa structures. This experimental study aims to have a better control of the oxide aperture shape used in oxide-confined photonics devices.
Fichier principal
Vignette du fichier
Lafleur_OMEx2018_process_dependence_of_AlOx_anisotropy.pdf (2.54 Mo) Télécharger le fichier
Origin : Publisher files allowed on an open archive
Loading...

Dates and versions

hal-01810561 , version 1 (19-06-2018)

Identifiers

Cite

Gael Lafleur, Guilhem Almuneau, Alexandre Arnoult, Henri Camon, Stéphane Calvez. Anisotropy in the wet thermal oxidation of AlGaAs: influence of process parameters. Optical Materials Express, 2018, 8 (7), pp.394 - 396. ⟨10.1364/OME.8.001788⟩. ⟨hal-01810561⟩
15 View
3 Download

Altmetric

Share

Gmail Facebook Twitter LinkedIn More