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BPN a new thick negative photoresist with high aspect ratio for MEMS applications

Abstract : The BPN is a negative photoresist, sensitive in the UV at 365 nm and was previously dedicated for Wafer Level Packaging (WLP) applications. This photoresist offer the advantage of forming thick layers, however, it suffers from low aspect ratio (2:1 declared by the supplier). This work reports the optimization of BPN's technological process enabling forming 30-160 lm thick molds for electroplating purposes. Our results revealed an aspect ratio as high as 16:1 while having vertical sidewalls using conventional photolithography.
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https://hal.laas.fr/hal-01873690
Contributor : David Bourrier <>
Submitted on : Thursday, September 13, 2018 - 3:20:25 PM
Last modification on : Friday, January 10, 2020 - 9:10:10 PM

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David Bourrier, Monique Dilhan, Ayad Ghannam, Lamine Ourak, Hugues Granier. BPN a new thick negative photoresist with high aspect ratio for MEMS applications. Microsystem Technologies, Springer Verlag, 2012, 19 (3), pp.419 - 423. ⟨10.1007/s00542-012-1648-0⟩. ⟨hal-01873690⟩

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