, , 2008.
Opportunities for SUEX dry laminate resist in microfluidic MEMS applications, Proceedings HARMST Hsinchu/Taiwan, pp.36-37, 2011. ,
How accurate are Stoney's equation and recent modifications, J Appl Phys, vol.88, p.5487, 2000. ,
DOI : 10.1063/1.1313776
Tiefenlithographieprozess für SU-8-dickschicht-funktionsstrukturen auf FR4-leiterplattenmaterial, Proceedings Technol Werkstoffe Mikrosyst Nanotechnik-2. GMM Workshop, vol.4, p.p, 2010. ,
Low stress ultrathick Su 8 UV photolithography process for MEMS, J Microlithogr Microfabr Microsyst, vol.4, p.43008, 2005. ,
DOI : 10.1117/1.2117108
Fabrication of 340-GHz folded waveguides using KMPR photoresist, IEE Electron Device Lett, vol.34, issue.3, 2013. ,
UV Lithography and molding fabrication of ultrathick micrometallic structures using a KMPR photoresist, J Microelectromechanical Sys, vol.19, issue.3, 2010. ,
Applications of novel high aspect ratio ultra-thick UV photoresist for micro electroplating, JMEMS, vol.20, issue.1, pp.794-796, 2011. ,